Infineon Technologies and Canon launch joint research project to accelerate introduction of 157nm lithography systems

Jun 12, 2001 | Technology Media

Joint News Release by Infineon Technologies and Canon

Tokyo, Munich, June 12, 2001 —Infineon Technologies AG (FSE/NYSE: IFX) and Canon Inc. (NYSE: CAJ) today announced an agreement to launch a joint research project for the development of photolithography systems utilizing 157nm (nanometer) exposure technology via F2 (fluorine) laser illumination. The joint effort is expected to accelerate the development of 157nm lithography systems, and the subsequent introduction of these systems in the manufacturing process of semiconductor devices. Infineon plans to introduce 157nm lithography for the production of memory and logic products at its advanced production sites.

Infineon Technologies will join in Canon’s development effort to speed up the realization of Canon’s first-generation F2 exposure system, which is scheduled for delivery to Infineon Technologies in the second quarter of 2003. Until that time joint research activities will be conducted at Canon Inc.’s Utsunomiya Optical Products Operations, comprising the gathering of process data regarding actual device manufacturing to enable the development of 70nm compatible exposure systems. Afterwards, the research will move to Infineon Technologies’ facilities for joint process development through the end of 2004. Canon requires various process data regarding actual device manufacturing in order to develop 70nm-compatible F2 exposure systems to succeed its ArF (argon fluoride) laser lithography tool lineup.

Infineon and Canon believe that semiconductor device manufacturers will need F2-laser based exposure systems, with the shorter 157nm wavelength, for the development and manufacturing of devices with 70nm groundrules. Exposure systems employing KrF (krypton fluoride, 248nm) and ArF (193nm) lasers are not able to pattern the fine lines required by the chip industry for miniaturization below 90nm and, thus, are not suited for the continued shrinking of device design rules. In order to stay on the International Technology Roadmap for Semiconductors (ITRS), which expects the volume production of 70nm memory devices to commence in 2006, the 157nm equipment will be needed for the development and prototyping of these devices several years in advance.

“This cooperation agreement brings together the huge resist process data and experience from Infineon Technologies and the sophisticated semiconductor equipment for lithography applications from Canon,” stated Andreas Oelmann, Vice President of Corporate Lithography of Infineon. “We are very pleased about this joint development program as we can start with the new 157nm lithography technology in time for our aggressive roadmap for the new memory and logic products of Infineon. In this joint work project Infineon will contribute both know how and manpower to speed up the development in Utsunomiya. Timing is very crucial for the introduction of the upcoming shrink nodes and we are confident that such a common program can win valuable months to stay ahead of the competition.”

“This is the first step in demonstrating Canon’s commitment to bring the most advanced optical lithography equipment and solutions to the market in a timely manner,” said Akira Tajima, Canon Inc. Director and Chief Executive of Optical Products Operations. “Because Canon’s objective is to provide not just the most advanced photolithography equipment, but a 157nm technology solution, Canon will work with our customers on process development, thus enabling technology experts from different areas to combine their individual expertise and focus on achieving a common goal.”


About Infineon Technologies


Infineon Technologies AG, Munich, Germany, offers semiconductor and system solutions for applications in the wired and wireless communications markets, for security systems and smartcards, for the automotive and industrial sectors, as well as memory products. With a global presence, Infineon operates in the US from San Jose, CA, in the Asia-Pacific region from Singapore and in Japan from Tokyo. In the fiscal year 2000 (ending September), the company achieved sales of Euro 7.28 billion with about 29,000 employees worldwide. Infineon is listed on the DAX index of the Frankfurt Stock Exchange and on the New York Stock Exchange (ticker symbol: IFX). Further information is available at www.infineon.com.

About Canon


Canon Inc. (NYSE: CAJ), headquartered in Tokyo, Japan, is a leader in the field of professional and consumer imaging equipment and information systems. Canon’s extensive range of products includes copiers, Bubble Jet and laser printers, cameras, video equipment, and semiconductor-manufacturing equipment. Originally established in 1937 as Precision Optical Industry, Co., Ltd., a camera manufacturer, Canon has successfully diversified and globalized into an industry leader in professional and consumer imaging systems and solutions. The company has approximately 86,000 employees worldwide with manufacturing and marketing subsidiaries in Japan, the Americas, Europe, Asia and Oceania, and a global R&D network with companies based in the United States, Europe, Asia and Australia. Canon’s consolidated sales for fiscal 2000 (ended December 31, 2000) totalled $24.2 billion (at an exchange rate of \115 = US$1). Visit the Canon Inc. website at www.canon.co.jp


Editorial Contacts:


Richard Berger, Canon Inc.
Tel: 03-5482-8055/Fax: 03-5482-5130
richard.berger@canon.co.jp

Information Number

INFCXX200106.088e